Resist evaluation for fabrication of diffractive optical elements (DOEs) with sub-micron resolution in a MEMS production line
Category
Academic article
Language
English
Author(s)
- Aina Kristin Herbjørnrød
- Kari Schjølberg-Henriksen
- Hallvard Angelskår
- Matthieu Jean P Lacolle
Affiliation
- SINTEF Digital / Smart Sensors and Microsystems
- University of Oslo
Year
2009Published in
Journal of Micromechanics and Microengineering (JMM)
ISSN
0960-1317
Publisher
IOP Publishing
Volume
19
Issue
12
