Tuning of resist slope with hardbaking parameters and release methods of extra hard photoresist for RF MEMS switches

Author(s)

• Shimul Chandra Saha
• Geir uri Jensen
• Tor A Fjeldly
• Trond Sæther
• Erik Poppe
• Håkon Sagberg

Affiliation

• Norwegian University of Science and Technology
• SINTEF
• Unknown

DOI