Abstract
Here we present the design and modeling of a novel piezoresistive microphone designed for a photoacoustic gas sensor system. The microphone is fabricated using a novel process to enable DRIE etch through of membranes of multiple thickness.
Academic chapter/article/Conference paper
English
EDA Publishing Association
Symposium on Design, Test, Integration & Packaging of MEMS/MOEMS, 2009. DTIP MEMS/MOEMS '09
256 - 260