Rate-Dependent Evolution of Microstructure and Stress in Silicon Films Deposited by Electron Beam Evaporation
Category
Academic article
Language
English
Affiliation
- SINTEF Digital / Smart Sensors and Microsystems
- SINTEF Industry / Sustainable Energy Technology
- SINTEF Industry / Metal Production and Processing
Year
2024Published in
Coatings
ISSN
2079-6412
Publisher
MDPI
Volume
14
Issue
7